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Consolidating Nikon's advanced technology
and experience in semiconductor photolithography field, as
demonstrated by the NSR series, the NRM overlay measurement
systems are high-precision, highly functional measuring instruments
that support leading-edge lithography. |
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SMP
mark (Self Measurement Program Mark) enables high-precision,
high-speed auto-measurement of the stepper's focusing; the
NRM Overlay Measurement System contributes to process management
of the most advanced devices.
*Equipped with high-precision dedicated optical system, optical
aberration is strictly managed in the components and assembly
production process. Objective lenses have also been specially
designed for Overlay Measurement. In addition, Nikon's exclusive
high-S/N and high dynamic range imaging system satisfies the
high precised requirement from state-of-the-art lithography.
*Accuracy of the stage positioning has been dramatically improved
by increasing rigidity. EGA, Enhanced Global Alignment, contributes
to have higher alignment precision. Wafer exchange time has
also been shortened, achieving high throughput of 150 wafers
per hour (5 points/wafer).
* Offers the world's highest COO.
* Equipped with user-friendly software to minimize the time
required for creating recipes. These recipes are fully compatible
with other Nikon NRM systems.
* Provides a stepper management system benefiting from considerable
Nikon expertise. The set-up system, data processing system,
and output formats are all compliant with the Automatic Measurement
System (AMS) of the NSR series. Customer's productivity is
significantly improved by replacing the stepper's AMS with
the NRM-1000A/3100. Of course, non-Nikon steppers can also
be supported by NRM-1000A/3100.
*Equipped with a wafer less recipe creation system to meet
the needs of small-lot production of different products. Steeper
alignment marks and other unique patterns are automatically
recognized, enabling the creation of recipes while wafers
are not loaded on the stage
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