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Incorporating the CFI60 optical system,
it supports both episcopic and diascopic illuminations and
is ideal for metallurgical applications. |
*Performs
brightfield observation with brightness 3 times greater than
conventional models
* Supports advanced microscopy with superior optical performance
including longer working distances, minimum flare and high
contrast
* Complete application of ergonomic design including its basic
design that is SEMI compliant
* New large stage with a 151 x 100 mm cross travel capable
of making diascopic observations of large-sized PCBs
* L-UEPI Universal Epi-illuminator ESD supports brightfield,
darkfield, DIC, and simple polarizing observations
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